The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Mar. 07, 2002
Applicants:
Beom-wook Lee, Uiwang, KR;
Ik-chul Lim, Suwon, KR;
Seung-joon Yoo, Suwon, KR;
Inventors:
Assignee:
Samsung SDI Co., Ltd., Suwon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C001/76 ;
U.S. Cl.
CPC ...
Abstract
A polymer for a chemically amplified negative photoresist and a photoresist composition are provided. A representative polymer of the invention is a compound of formula 5:
Lee, Beom-Wook. (2005). Chemically amplified negative photoresist, and photoresist composition (U.S. Patent No. 6872502). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6872502
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile