The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Jul. 30, 2002
Applicants:
Hiroaki Yamaguchi, Tokyo, JP;
Ryoichi Sato, Tokyo, JP;
Shuichi Hashiguchi, Tokyo, JP;
Masafumi Kohda, Toyko, JP;
Inventors:
Hiroaki Yamaguchi, Tokyo, JP;
Ryoichi Sato, Tokyo, JP;
Shuichi Hashiguchi, Tokyo, JP;
Masafumi Kohda, Toyko, JP;
Assignee:
Ube Industries, Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B025/20 ;
U.S. Cl.
CPC ...
Abstract
An atomic oxygen-resistant film comprising an atomic oxygen-resistant film formed on a polyimide film, wherein the mass reduction rate thereof is no greater than 1.0% when irradiated with atomic oxygen at an irradiation dose of appromixately 3×10atoms/cmat a speed of about 8 km/sec.
Yamaguchi, Hiroaki. (2005). Atomic oxygen-resistant film (U.S. Patent No. 6872457). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6872457
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile