The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Mar. 19, 2002
Barry Lee-mean Yang, Clifton Park, NY (US);
Charles Dominic Iacovangelo, Niskayuna, NY (US);
Kenneth Walter Browall, Schenectady, NY (US);
Steven Marc Gasworth, Farmington Hills, MI (US);
William Arthur Morrison, Albany, NY (US);
James Neil Johnson, Niskayuna, NY (US);
Barry Lee-Mean Yang, Clifton Park, NY (US);
Charles Dominic Iacovangelo, Niskayuna, NY (US);
Kenneth Walter Browall, Schenectady, NY (US);
Steven Marc Gasworth, Farmington Hills, MI (US);
William Arthur Morrison, Albany, NY (US);
James Neil Johnson, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.