The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Nov. 15, 2002
Trent N. Butcher, Sandy, UT (US);
Ralph M. Horton, Murray, UT (US);
Stephen R. Jurewicz, Northridge, CA (US);
Danny E. Scott, Montgomery, TX (US);
Redd H. Smith, Salt Lake City, UT (US);
Trent N. Butcher, Sandy, UT (US);
Ralph M. Horton, Murray, UT (US);
Stephen R. Jurewicz, Northridge, CA (US);
Danny E. Scott, Montgomery, TX (US);
Redd H. Smith, Salt Lake City, UT (US);
Baker Hughes Incorporated, Houston, TX (US);
Abstract
The residual stresses that are experienced in polycrystalline diamond cutters, which lead to cutter failure, can be effectively modified by selectively thinning the carbide substrate subsequent to high temperature, high pressure (sinter) processing, by selectively varying the material constituents of the carbide substrate, by subjecting the PDC cutter to an annealing process during sintering, by subjecting the formed PDC cutter to a post-process stress relief anneal, or a combination of those means.