The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Nov. 01, 2001
William R. Entley, San Jose, CA (US);
John G. Langan, Pleasanton, CA (US);
Randy Hall, Santa Cruz, CA (US);
William R. Entley, San Jose, CA (US);
John G. Langan, Pleasanton, CA (US);
Randy Hall, Santa Cruz, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
In accordance with an embodiment of the present intention, a fluorine residue removing method includes: supplying an oxygen-containing gas and a hydrogen-containing gas into a CVD chamber; producing a plasma of a mixture of the oxygen-containing gas and the-hydrogen containing gas, so that the plasma reacts with the fluorine residue, exothermically generating water; and evacuating from the CVD chamber a product of the reaction between the plasma and the fluorine residue. For the hydrogen-containing gas, NHis often used, and for the oxygen-containing gas, NO, O, or air is used. Exemplary mixtures of the oxygen-containing and the hydrogen-containing gases include 70 mol % NO/NH, 50 mol % NO/NH, and 52 mol % O/NH. An inert gas, such as He, Ne, Ar, or Kr, can be optionally supplied into the chamber to stabilize the plasma.