The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2005
Filed:
Aug. 30, 2002
Bernd Martens, Uetersen, DE;
Sadan Deral, Winsen/Luhe, DE;
Wolfram Szczepaniak, Stelle, DE;
Nils Hansen, Seevetal, DE;
Bernd Martens, Uetersen, DE;
Sadan Deral, Winsen/Luhe, DE;
Wolfram Szczepaniak, Stelle, DE;
Nils Hansen, Seevetal, DE;
Maschinenfabrik Max Kroenert GmbH & Co., Hamburg, DE;
Abstract
The invention pertains to a pressure chamber scraper for application of a liquid medium onto a rotating drum, said pressure chamber scraper having an axially extending scraper head, that together with an axially extending dosing scraper touching the mantle surface of the drum and with a sealing scraper forms a chamber in the circumferential direction, in said chamber there is an axially extending displacement element to form a pressure compartment and an outlet compartment and leaving an application gap to the mantle surface of the drum, and the liquid medium for wetting of the mantle surface flows through said gap, wherein the medium is supplied through an inlet opening into the pressure compartment. According to the invention, it is proposed that the displacement element and scraper head have mutually facing contact surfaces which bound at least one gap between them which opens into the pressure compartment and connects it to the inlet opening, so that the medium can move into the pressure compartment. With this kind of design it is possible to configure the gap as narrow as desired.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile