The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Jan. 09, 2001
Lanshi Zheng, Eden Prairie, MN (US);
Lance E. Stover, Eden Prairie, MN (US);
Jianxin Zhu, Eagan, MN (US);
Weimin Qian, Bloomington, MN (US);
Lowell J. Berg, Eden Prairie, MN (US);
Moshe Olim, Eden Prairie, MN (US);
Lanshi Zheng, Eden Prairie, MN (US);
Lance E. Stover, Eden Prairie, MN (US);
Jianxin Zhu, Eagan, MN (US);
Weimin Qian, Bloomington, MN (US);
Lowell J. Berg, Eden Prairie, MN (US);
Moshe Olim, Eden Prairie, MN (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A method of contouring a surface of a slider for supporting a transducer relative to a data storage medium includes applying a lithographic resist layer to the slider surface. The resist layer is then exposed through a single mask having 3a mask pattern defined by variation in an optical density through the mask. The resist layer is exposed in an exposure pattern corresponding to the mask pattern. Portions of the resist layer are removed as a function of the exposure pattern to produce a vertically contoured resist layer. The slider surface is etched through the vertically contoured resist layer during a single etching step to form a vertically contoured surface feature within the slider surface.