The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Apr. 23, 2003
Takashi Kanatake, Torokozawa, JP;
Takashi Kanatake, Torokozawa, JP;
Ball Semiconductor, Inc., Allen, TX (US);
Abstract
A method for increasing a scan rate in a photolithography system by increasing a unit travel length while maintaining a minimum resolution is provided. The method includes determining the minimum resolution and a pixel spacing distance equal to the unit travel length. The method also includes calculating a window size based on the minimum resolution and the pixel spacing distance. A plurality of windows of the calculated size are established so that a pixel in a first window is offset from a pixel in a second window by the minimum resolution in a first dimension and the pixel spacing distance in a second dimension, and one of the plurality of windows is selected for projection onto a subject.