The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Jan. 18, 2002
Applicant:
Hiroshi Kurosawa, Chiba, JP;
Inventor:
Hiroshi Kurosawa, Chiba, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/42 ; G03B027/68 ; G01B011/00 ;
U.S. Cl.
CPC ...
Abstract
A scanning exposure apparatus is provided that is capable of increasing the overlay accuracy. Every time a reticle is exchanged, a direction overlay correction table is updated. A control device for the exposure apparatus corrects the target positions (target locus) of a wafer stage on the basis of the direction overlay correction table.
Quick Actions:
Kurosawa, Hiroshi. (2005). Exposure method and apparatus, and device manufacturing method (U.S. Patent No. 6870599). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6870599
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile