The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Aug. 26, 2003
Chii-wann Lin, Taipei, TW;
Chen Kung Huang, Taipei, TW;
Shiming Lin, Taipei, TW;
Chih Kung Lee, Taipei, TW;
Peizen Chang, Taipei, TW;
Shu Sheng Lee, Taipei, TW;
Chii-Wann Lin, Taipei, TW;
Chen Kung Huang, Taipei, TW;
Shiming Lin, Taipei, TW;
Chih Kung Lee, Taipei, TW;
Peizen Chang, Taipei, TW;
Shu Sheng Lee, Taipei, TW;
National Taiwan University, Taipei, TW;
Abstract
A symmetric or asymmetric multilayer structure based on the technique of surface plasmon resonance (SPR) has been applied for modulation of resonant angle and wavelength. The fabrication of this invention can have nanoscale thin film layers up to several hundreds, while each layer has its own material of a high or low refractive index value, and the total layers in a thickness of tens to hundreds nanometers are grown in this single structure. This invention is intended for optimizing the scanning of mechanism by modulating SPR resonant angle and wavelength, and for developing the prospect of portable instruments.