The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Nov. 15, 2000
Shigeyoshi Suzuki, Tokyo, JP;
Yasuo Tsubai, Tokyo, JP;
Sadao Kuriu, Tokyo, JP;
Toshihito Maruyama, Tokyo, JP;
Kenji Hirata, Tokyo, JP;
Masato Asano, Tokyo, JP;
Masahiko Saikawa, Tokyo, JP;
Akira Furukawa, Tokyo, JP;
Shigeyoshi Suzuki, Tokyo, JP;
Yasuo Tsubai, Tokyo, JP;
Sadao Kuriu, Tokyo, JP;
Toshihito Maruyama, Tokyo, JP;
Kenji Hirata, Tokyo, JP;
Masato Asano, Tokyo, JP;
Masahiko Saikawa, Tokyo, JP;
Akira Furukawa, Tokyo, JP;
Mitsubishi Paper Mills Limited, Tokyo, JP;
Abstract
There is disclosed a method of processing a light-sensitive material which comprises exposing a light-sensitive material having at least one light-sensitive layer on a support, and subjecting to development by a dipping system or a coating system, and then, peeling at least the light-sensitive layer off by bringing a peeling material into close contact with the light-sensitive material, wherein the peeling material is a material having a liquid-absorbing rate in which a liquid-absorption amount within 0.1 second after getting in contact with a liquid is 60% or more based on a liquid-absorption amount within 0.2 second after the same.