The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Feb. 02, 2004
Applicants:
Keiji Suzuki, Kanagawa-ken, JP;
Hideki Ookawa, Kanagawa-ken, JP;
Junichi Tonotani, Kanagawa-ken, JP;
Inventors:
Keiji Suzuki, Kanagawa-ken, JP;
Hideki Ookawa, Kanagawa-ken, JP;
Junichi Tonotani, Kanagawa-ken, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ; H01L021/302 ;
U.S. Cl.
CPC ...
Abstract
In a method for exposing a photosensitive resist layer with near-field light, a liquid film layer is provided between the photosensitive resist layer and a photomask. The photomask has a light-shielding film containing an opening portion through which a propagated light emitted from a light source cannot pass. The photosensitive resist layer is exposed with near-field light through the opening portion and the liquid film layer.