The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Sep. 28, 2001
Applicant:
Minehisa Imazato, Tokyo, JP;
Inventor:
Minehisa Imazato, Tokyo, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M008/10 ;
U.S. Cl.
CPC ...
Abstract
Processes and methods for producing a gas diffusion electrode are provided. The process of the present invention includes the steps of forming a sheet or other suitable structure of carbonaceous material and forming a catalyst layer on the carbonaceous material by vapor deposition.
Imazato, Minehisa. (2005). Process for producing gas diffusion electrode and electrochemical device (U.S. Patent No. 6869721). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6869721
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile