The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
May. 15, 2002
Ramgopal Darolia, West Chester, OH (US);
Reed Roeder Corderman, Niskayua, NY (US);
Joseph David Rigney, Milford, OH (US);
Richard Arthur Nardi, Jr., Scotia, NY (US);
Michael James Weimer, Loveland, OH (US);
Ramgopal Darolia, West Chester, OH (US);
Reed Roeder Corderman, Niskayua, NY (US);
Joseph David Rigney, Milford, OH (US);
Richard Arthur Nardi, Jr., Scotia, NY (US);
Michael James Weimer, Loveland, OH (US);
General Electric Company, Schenectady, NY (US);
Abstract
A PVD process and apparatus () for depositing a coating () from multiple sources () of different materials. The process and apparatus () are particulaity intended to deposit a beta-nickel aluminide coating () containing one or more elements whose vapor pressures are lower than NiAl. The PVD process and apparatus () entail feeding at least two materials () into a coating chamber () and evaporating the materials () at different rates from separate molten pools () thereof. Articles () to be coated are suspended within the coating chamber (), and transported with a support apparatus () relative to the two molten pools () so as to deposit a coating () with a controlled composition that is a mixture of the first and second materials ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile