The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2005

Filed:

Sep. 09, 2003
Applicants:

Sung-in RO, Kumi, KR;

Hyeon-cheol Kim, Kumi, KR;

Yong-woo Park, Seoul, KR;

Inventors:

Sung-In Ro, Kumi, KR;

Hyeon-cheol Kim, Kumi, KR;

Yong-Woo Park, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N021/00 ;
U.S. Cl.
CPC ...
Abstract

Disclosed is a residual stress measuring system for measuring the residual stress in an optical fiber. The residual stress measuring system comprises a light source for generating light used to measure the residual stress, a lens system for converting the generated light into a plane wave, a polarimeter for transforming the converted light to an input polarized light, which is incident on the optical fiber, a rotational measuring section for rotating the optical fiber so as to enable the polarized light to transmit through the optical fiber in various directions, and a detector for detecting the residual stress from a phase shift of the transmitted light.


Find Patent Forward Citations

Loading…