Ozone treatment method and ozone treatment apparatus

Abstract

The invention concerns an ozone treatment method and an ozone treatment apparatus for performing a treatment such as the formation and reformation of an oxide film, the removal of a resist film by blowing an ozone gas onto a surface of a substrate such as a semiconductor substrate or liquid crystal substrate. The ozone treatment apparatusincludes: a placement tableon which the substrate K is placed; a heating unit for heating the substrate K placed on the placement table; an opposed plate, disposed opposite the substrate K, for discharging the ozone gas through a discharge portformed in a surface facing the substrate K, a gas feeding meansfor feeding the ozone gas into the discharge port; a lifterfor moving the placement tableup and down; and a control unitfor controlling the operation of said lifter. During the discharge of the ozone gas, the control unitoperates the lifterso as to vary the spacing g between the opposed plateand the substrate K placed on the placement table