The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2005
Filed:
Mar. 20, 2003
Xingfu Chen, Eden Prairie, MN (US);
Daniel Lynch, Southwick, MA (US);
Nelson Mark, Manchester, CT (US);
Walter Bosenberg, Simsbury, CT (US);
Jason Xu, New Haven, CT (US);
Lawrence Brodsky, Tolland, CT (US);
John Clark, Somers, CT (US);
Xingfu Chen, Eden Prairie, MN (US);
Daniel Lynch, Southwick, MA (US);
Nelson Mark, Manchester, CT (US);
Walter Bosenberg, Simsbury, CT (US);
Jason Xu, New Haven, CT (US);
Lawrence Brodsky, Tolland, CT (US);
John Clark, Somers, CT (US);
JDS Uniphase Corporation, San Jose, CA (US);
Abstract
An electrode structure wherein galvanic corrosion at adhesion layers formed between electrodes and electronic or electro-optic substrates is eliminated. The electrode structure includes an electro-optic crystalline substrate, an amorphous layer disposed on the crystalline substrate, the amorphous layer having a composition substantially similar to a composition of the crystalline substrate, and a gold layer disposed directly on the amorphous layer. The amorphous layer is created using ion sputtering etching techniques that clean and activate the surface of the crystalline substrate such that the gold layer is able to adhere to it.