The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2005
Filed:
Aug. 23, 2001
Applicant:
Harry F. Schramm, Winchester, TN (US);
Inventor:
Harry F. Schramm, Winchester, TN (US);
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C014/34 ;
U.S. Cl.
CPC ...
Abstract
A method for providing an ultra thin electrical circuit integral with a portion of a surface of an object, including using a focal Vacuum Arc Vapor Deposition device having a chamber, a nozzle and a nozzle seal, depressing the nozzle seal against the portion of the object surface to create an airtight compartment in the chamber and depositing one or more ultra thin film layer(s) only on the portion of the surface of the object, the layers being of distinct patterns such that they form the circuit.
Quick Actions:
Schramm, Harry. (2005). Method of forming ultra thin film devices by vacuum arc vapor deposition (U.S. Patent No. 6866752). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6866752
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile