The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Nov. 28, 2000
Howard Turner, Campbell, CA (US);
G. Cameron Dales, Palo Alto, CA (US);
Lynn Vanerden, Livermore, CA (US);
Johannes A. M. Vanbeek, New Orleans, LA (US);
Damian A. Hajduk, San Jose, CA (US);
Ralph B. Nielsen, San Jose, CA (US);
Paul Mansky, San Francisco, CA (US);
Leonid Matsiev, Cupertino, CA (US);
Pei Wang, San Jose, CA (US);
Eric Mcfarland, Santa Barbara, CA (US);
Howard Turner, Campbell, CA (US);
G. Cameron Dales, Palo Alto, CA (US);
Lynn VanErden, Livermore, CA (US);
Johannes A. M. VanBeek, New Orleans, LA (US);
Damian A. Hajduk, San Jose, CA (US);
Ralph B. Nielsen, San Jose, CA (US);
Paul Mansky, San Francisco, CA (US);
Leonid Matsiev, Cupertino, CA (US);
Pei Wang, San Jose, CA (US);
Eric McFarland, Santa Barbara, CA (US);
Symyx Technologies, Inc., Santa Clara, CA (US);
Abstract
Devices and methods for controlling and monitoring the progress and properties of multiple reactions are disclosed. The method and apparatus are especially useful for synthesizing, screening, and characterizing combinatorial libraries, but also offer significant advantages over conventional experimental reactors as well. The apparatus generally includes multiple vessels for containing reaction mixtures, and systems for controlling the stirring rate and temperature of individual reaction mixtures or groups of reaction mixtures. In addition, the apparatus may include provisions for independently controlling pressure in each vessel, and a system for injecting liquids into the vessels at a pressure different than ambient pressure. In situ monitoring of individual reaction mixtures provides feedback for process controllers, and also provides data for determining reaction rates, product yields, and various properties of the reaction products, including viscosity and molecular weight. Computer-based methods are disclosed for process monitoring and control, and for data display and analysis.