The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Aug. 05, 2003
Applicants:
Richard Novak, Plymouth, MN (US);
Ismail Kashkoush, Orefield, PA (US);
Inventors:
Richard Novak, Plymouth, MN (US);
Ismail Kashkoush, Orefield, PA (US);
Assignee:
Akrion, LLC, Allentown, PA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C001/22 ; C03C015/00 ; C03C025/68 ; C23F001/00 ; H01L021/302 ; H01L021/461 ;
U.S. Cl.
CPC ...
Abstract
A method of removing photoresist from semiconductor wafers through the use of a sparger plate. According to the inventive method, at least one semiconductor wafer is positioned in a process tank above the sparger plate. A mixture of ozone and deionized water is introduced into the process tank at a position below the sparger plate. The mixture of ozone and deionized water is then introduced across the wafer via the sparger plate at an increased flow velocity while the wafer is submerged in the mixture of deionized water and ozone.