The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Aug. 07, 2003
Eiji Shidoji, Yokohama, JP;
Eiichi Ando, Yokohama, JP;
Tomohiro Yamada, Yokohama, JP;
Takahiro Mashimo, Yokohama, JP;
Eiji Shidoji, Yokohama, JP;
Eiichi Ando, Yokohama, JP;
Tomohiro Yamada, Yokohama, JP;
Takahiro Mashimo, Yokohama, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.