The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2005

Filed:

May. 26, 2000
Applicants:

Vivian Dall'armi, London, CA;

Gang Fang, North York, CA;

Yuri Lawryshyn, Komoka, CA;

Joseph Lem, London, CA;

Douglas Penhale, London, CA;

Inventors:

Vivian Dall'Armi, London, CA;

Gang Fang, North York, CA;

Yuri Lawryshyn, Komoka, CA;

Joseph Lem, London, CA;

Douglas Penhale, London, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B003/04 ;
U.S. Cl.
CPC ...
Abstract

A cleaning apparatus () for a radiation source assembly () in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber () and a second chamber () independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.


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