The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Oct. 04, 2000
Steven Treiber, Toronto, CA;
Ashuraj Sirohi, North Andover, MA (US);
Subhash Ghorpade, Houston, TX (US);
Simon Lingard, Lexington, MA (US);
Sundaram Ramanathan, Lexington, MA (US);
Chau-chyun Chen, Lexington, MA (US);
Steven Treiber, Toronto, CA;
Ashuraj Sirohi, North Andover, MA (US);
Subhash Ghorpade, Houston, TX (US);
Simon Lingard, Lexington, MA (US);
Sundaram Ramanathan, Lexington, MA (US);
Chau-Chyun Chen, Lexington, MA (US);
Aspen Technology, Inc., Cambridge, MA (US);
Abstract
Computer method and apparatus determines state of physical properties, i.e. product quality, of a chemical manufacturing process. A steady state modeler provides a rigorous steady state model of the process and instantaneous state of physical properties. An estimator or inferential sensing member determines state of the physical properties over time based on the steady state (instantaneous) values of the physical properties. To that end, a dynamic model of the subject process is formed from the steady state model. The computer method and apparatus may be part of a network such that laboratory and sensor measured process data is made accessible by the steady state modeler and the estimator, and the estimator provides process parameter values for maintaining state of the physical properties. The network also enables online and user-interactive access to the steady state model, the dynamic model and/or the parameter values for enabling control of the subject process.