The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Nov. 06, 2003
Bernd Heinz, Sevelen, CH;
Martin Dubs, Trubbach, CH;
Thomas Eisenhammer, Azmoos, CH;
Pius Grunenfelder, Wangs, CH;
Walter Haag, Grabs, CH;
Stanislav Kadlec, Buchs, CH;
Siegfried Krassnitzer, Feldkirch, AT;
Bernd Heinz, Sevelen, CH;
Martin Dubs, Trubbach, CH;
Thomas Eisenhammer, Azmoos, CH;
Pius Grunenfelder, Wangs, CH;
Walter Haag, Grabs, CH;
Stanislav Kadlec, Buchs, CH;
Siegfried Krassnitzer, Feldkirch, AT;
Unaxis Balzers Limited, Balzers, LI;
Abstract
A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.