The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Dec. 21, 2000
Applicant:
IL Ryong Park, Kumi-shi, KR;
Inventor:
Il Ryong Park, Kumi-shi, KR;
Assignee:
LG. Philips LCD Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/00 ;
U.S. Cl.
CPC ...
Abstract
An integrated etch/strip/clean apparatus is disclosed. The apparatus includes an etching line to etch and clean a substrate, a stripping line to strip the etched substrate, and a cleaning line to clean and dry the substrate. The cleaning line is on the stripping line. Accordingly, etch, strip and cleaning processes is performed by a single equipment. As a result, processing time installation space requirement of the equipment are reduced. Further, contamination of the substrate is prevented.
Park, Il. (2005). Etch/strip apparatus integrated with cleaning equipment (U.S. Patent No. 6860964). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6860964
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