The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2005

Filed:

Nov. 06, 2002
Applicants:

Hyun-kyu Lee, Seoul, KR;

Myoung-kee Baek, Seoul, KR;

Inventors:

Hyun-Kyu Lee, Seoul, KR;

Myoung-Kee Baek, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F017/14 ;
U.S. Cl.
CPC ...
Abstract

A method for patterning includes filling ink in a recess of a cliché corresponding to a position of a pattern which will be formed, transferring the ink onto a surface of a transfer roll by rotating the transfer roll while the transfer roll is contacted to the cliché, detecting variation of the substrate by calculating the area of the substrate on which the ink is transferred, calculating moving speed of the substrate on a basis of the detected variation, and re-transferring the ink on the surface of the transfer roll onto the substrate by rotating the transfer roll when the transfer roll is contacted to the substrate while moving the substrate at the calculated moving speed.


Find Patent Forward Citations

Lee, Hyun-Kyu. (2005). Ink printing apparatus for compensating mis-alignment of patterns caused by subtrate variation and patterning method using the same (U.S. Patent No. 6860199). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6860199

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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