The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Jan. 24, 2003
Applicant:
Renliang Xu, Pembroke Pines, FL (US);
Inventor:
Renliang Xu, Pembroke Pines, FL (US);
Assignee:
Coulter International Corp., Miami, FL (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N015/02 ;
U.S. Cl.
CPC ...
Abstract
A particle sizing method and apparatus of the PIDS type uses randomly polarized radiation to irradiate a particle sample. Portions of the resulting side scattering pattern are decomposed to simultaneously produce, for each decomposed portion, first and second linearly polarized beams of radiation in which the respective planes of polarization of the two beams are mutually perpendicular. Each of the polarized beams is focused onto a photodetector, and the respective photodetector outputs are differentiated to provide PIDS signals that are useful in calculating a particle size distribution for the sample.