The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Dec. 04, 2002
Hirokazu Tamura, Wellsley, MA (US);
Matthew J. Neal, Marlborough, MA (US);
Justin C. Borski, Webster, MA (US);
Alan L. Sidman, Wellesley, MA (US);
Hirokazu Tamura, Wellsley, MA (US);
Matthew J. Neal, Marlborough, MA (US);
Justin C. Borski, Webster, MA (US);
Alan L. Sidman, Wellesley, MA (US);
Advanced Micriosensors, Shrewsbury, MA (US);
Furukawa American, Inc., Clinton, NJ (US);
Abstract
A Microelectromechanical (MEMS) device that can minimize the effects of fabrication tolerances on the operation of the device can include a MEMS electromagnetic actuator to selectively generate displacement forces to displace an actuable element along a path. A cantilever can apply an opposing force to the actuable element to control the amount of displacement. Coil ends of the actuator can be shaped to vary a gap distance between the coil ends, and/or the magnetic portion of the actuable element may be shaped, so as to vary the force applied to the actuable element along the displacement axis. One or more pins located in the deflection path of the cantilever can contact the cantilever at one or more points so as to change the bending resistance of the cantilever. The cross-section of the cantilever can also be varied along its length so as to change the bending resistance of the cantilever.