The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2005

Filed:

Jan. 17, 2003
Applicants:

Steven C. Deane, Redhill, GB;

Ian D. French, Brighton, GB;

Inventors:

Steven C. Deane, Redhill, GB;

Ian D. French, Brighton, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/00 ;
U.S. Cl.
CPC ...
Abstract

A method of forming an active plate for a liquid crystal display includes depositing and patterning a gate conductor layer over an insulating substrate; depositing a gate insulator layer over the patterned gate conductor layer; depositing a silicon layer over the gate insulator layer; depositing arid patterning a source and drain conductor layer over the silicon layer; and forming a pixel electrode layer for contacting one of the source and drain of the transistor. The silicon layer includes plasma deposition from a gas comprising at least a compound including an n-type dopant atom and a gas containing silicon, with the ratio of the volume of the compound to the volume of the gas containing silicon being selected to give a doping density of the n-type dopant atoms in the silicon layer of between 2.5×10and 1.5×10atoms per cm.


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