The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Feb. 21, 2002
Geun Su Lee, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Min Ho Jung, Kyoungki-do, KR;
Cha Won Koh, Seoul, KR;
Ki Soo Shin, Seoul, KR;
Geun Su Lee, Kyoungki-do, KR;
Jae Chang Jung, Kyoungki-do, KR;
Min Ho Jung, Kyoungki-do, KR;
Cha Won Koh, Seoul, KR;
Ki Soo Shin, Seoul, KR;
Hynix Semiconductor Inc., Kyoungki-do, KR;
Abstract
Photoresist monomers, photoresist polymers prepared thereof, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers comprising maleimide monomer represented by Formula 1, and a composition comprising the polymer thereof are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in an aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, and it is suitable for a process using ultraviolet light source such as VUV (157 nm)wherein, X, X, R, Rand Rare defined in the specification.