The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2005

Filed:

Oct. 04, 2002
Applicants:

Anthony P. Kitson, Evans, CO (US);

Kevin B. Ray, Fort Collins, CO (US);

Eugene L. Sheriff, Carr, CO (US);

Inventors:

Anthony P. Kitson, Evans, CO (US);

Kevin B. Ray, Fort Collins, CO (US);

Eugene L. Sheriff, Carr, CO (US);

Assignee:

Kodak Polychrome Graphics, LLP, Norwalk, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/004 ; G03F007/30 ;
U.S. Cl.
CPC ...
Abstract

Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.


Find Patent Forward Citations

Loading…