The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Mar. 19, 2001
John D. Affinito, Tucson, AZ (US);
Gordon L. Graff, West Richland, WA (US);
Peter M. Martin, Kennewick, WA (US);
Mark E. Gross, Pasco, WA (US);
Paul E. Burrows, Kennewick, WA (US);
Linda S. Sapochak, Henderson, NV (US);
John D. Affinito, Tucson, AZ (US);
Gordon L. Graff, West Richland, WA (US);
Peter M. Martin, Kennewick, WA (US);
Mark E. Gross, Pasco, WA (US);
Paul E. Burrows, Kennewick, WA (US);
Linda S. Sapochak, Henderson, NV (US);
Battelle Memorial Institute, Richland, WA (US);
Abstract
A method for making a polymer layer with a selected index of refraction. The method includes flash evaporating a polymer precursor material capable of cross linking into a polymer with the selected index of refraction, forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, and cryocondensing the glow discharge polymer precursor plasma on a substrate as a condensate and crosslinking the condensate thereon, the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma, forming a polymer having the selected index of refraction.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile