The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Sep. 11, 2002
Jason T Gentry, Wellington, CO (US);
David D. Balhiser, Fort Collins, CO (US);
Ronald G Harber, Loveland, CO (US);
Bryan Haskin, Ft. Collins, CO (US);
Gayvin E Stong, Fort Collins, CO (US);
Paul J. Marcoux, Fort Collins, CO (US);
Jason T Gentry, Wellington, CO (US);
David D. Balhiser, Fort Collins, CO (US);
Ronald G Harber, Loveland, CO (US);
Bryan Haskin, Ft. Collins, CO (US);
Gayvin E Stong, Fort Collins, CO (US);
Paul J. Marcoux, Fort Collins, CO (US);
Agilent Technologies, Inc., Palo Alto, CA (US);
Abstract
A method and system of identifying one or more nets in a digital IC design that are at risk of electromigration comprises selecting a manufacturing process for the digital IC design and obtaining a clock period and process voltage. A voltage waveform transition time and effective capacitance is calculated for one or more of the nets. A maximum allowable effective capacitance for each one of the nets is calculated based upon a peak current analysis or an RMS current analysis. The effective capacitance for each net is compared against the maximum allowable capacitance to identify those nets that are at risk of failure due to the effects of electromigration.