The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Jan. 09, 2003
Applicants:
Jaideva C. Goswami, Houston, TX (US);
Denis J. Heliot, Sugar Land, TX (US);
Jacques R. Tabanou, Houston, TX (US);
Christopher E. Morriss, Sugar Land, TX (US);
Inventors:
Jaideva C. Goswami, Houston, TX (US);
Denis J. Heliot, Sugar Land, TX (US);
Jacques R. Tabanou, Houston, TX (US);
Christopher E. Morriss, Sugar Land, TX (US);
Assignee:
Schlumberger Technology Corporation, Sugar Land, TX (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01V009/00 ;
U.S. Cl.
CPC ...
Abstract
A method for determining a formation dip angle including extracting features from an acquired well log to obtain a set of features, validating the set of features to obtain a subset of features, generating a layered model using the subset of features, and generating a synthetic log using the layered model and a forward model.