The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2005

Filed:

Jan. 09, 2003
Applicants:

Jaideva C. Goswami, Houston, TX (US);

Denis J. Heliot, Sugar Land, TX (US);

Jacques R. Tabanou, Houston, TX (US);

Christopher E. Morriss, Sugar Land, TX (US);

Inventors:

Jaideva C. Goswami, Houston, TX (US);

Denis J. Heliot, Sugar Land, TX (US);

Jacques R. Tabanou, Houston, TX (US);

Christopher E. Morriss, Sugar Land, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01V009/00 ;
U.S. Cl.
CPC ...
Abstract

A method for determining a formation dip angle including extracting features from an acquired well log to obtain a set of features, validating the set of features to obtain a subset of features, generating a layered model using the subset of features, and generating a synthetic log using the layered model and a forward model.


Find Patent Forward Citations

Goswami, Jaideva. (2005). Method and apparatus for determining regional dip properties (U.S. Patent No. 6856910). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6856910

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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