The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Oct. 22, 2001
Applicant:
Richard A. Metzler, Mission Viejo, CA (US);
Inventor:
Richard A. Metzler, Mission Viejo, CA (US);
Assignee:
Integrated Discrete Devices, LLC, Costa Mesa, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L021/331 ; H01L021/44 ;
U.S. Cl.
CPC ...
Abstract
Methods and apparatus of forming a semiconductor device using pedestals and sidewalls. The pedestals and sidewalls may provide an etch stop and/or a diffusion barrier during manufacture of a semiconductor device. Processes of forming diode connected vertical cylindrical field effect devices are disclosed to exemplify the use of the pedestals and/or sidewalls. A system for forming the pedestals and sidewalls is described.
Metzler, Richard. (2005). Sidewalls as semiconductor etch stop and diffusion barrier (U.S. Patent No. 6855614). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6855614
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile