The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Nov. 13, 2002
Ming Lai, Pleasanton, CA (US);
Mei Juan Yuan, Dublin, CA (US);
Ming Lai, Pleasanton, CA (US);
Mei Juan Yuan, Dublin, CA (US);
Other;
Abstract
The optical tracking device of the present invention is contemplated to obtain a large tracking range in an open loop configuration. The tracking device projects and scans two probe beams across a symmetric reference landmark that has at least two symmetric lines or axes. The two probe beams scan repeatedly and alternatively along two directions of which each is perpendicular to a symmetric line of the reference mark. For each scan, a substantially symmetric profile is generated in the scattered light as the beam scans across the boundary on each side of the symmetric reference. This symmetric profile in the scattered light is detected and used to determine the position of the related symmetric line. The position detection of the symmetric line is independent from the object's movement along the direction of the symmetric line. The scattered-light signal from the two probe beams is separated by synchronized detection in the time domain. This way, the two probe beams scan and sense the positions of two symmetric lines and then the crossing point between the two lines determines the lateral position of the object to be tracked. The two symmetric lines may or may not be perpendicular to each other. The range of this detection is substantially as large as the size of the reference landmark.