The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Mar. 28, 2001
Mikio Tanaka, Tokyo, JP;
Masaaki Sugimoto, Tokyo, JP;
Mikio Tanaka, Tokyo, JP;
Masaaki Sugimoto, Tokyo, JP;
NEC Electronics Corporation, Kanagawa, JP;
Abstract
Provided are a device, method and storage medium, which, when a memory LSI defect analysis apparatus is used as a monitoring device to estimate reductions in yield, automatically interprets results, and calculates the period of distribution patterns and the mix rate of regular patterned defects. The total defect number of bits is found, and the factor f, is selected. The value of expected value functions, T(f), for the selected f is found, and if it is decided that regularly patterned defects are included, then regular pattern defect mix rate function MR(f) is calculated from number of bits, factor f, and the value of estimated value function T(f). If it is decided that it does not contain regularly patterned defects the regular patterned defect mix rate function MR(f) is assumed to be zero; and it is confirmed whether or not MR(f) has been found for every f.