The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 08, 2005

Filed:

May. 16, 2003
Applicants:

Yury Logvin, Ottawa, CA;

Adrian O'donnell, Ottawa, CA;

Inventors:

Yury Logvin, Ottawa, CA;

Adrian O'Donnell, Ottawa, CA;

Assignee:

Metrophotonics Inc., Ottawa, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B006/10 ;
U.S. Cl.
CPC ...
Abstract

A design for controlling optical modes in a closely spaced weakly confined waveguide array is described wherein the crosstalk between individual waveguides is suppressed by segmented deep etched trenches. One exemplary embodiment of the invention incorporates a shallow etched ridge waveguide array at the output coupler of a semiconductor optical demultiplexer. In this situation, all higher order modes and supermodes are filtered by a sequence of deep etched trenches located between the shallow etched ridge waveguides. The trenches have a minimal effect on the single fundamental mode of the individual shallow etched waveguides because the trenches are located far enough from the ridge waveguides where an evanescent tail of the fundamental mode approaches a minimal power level. The trenches affect and suppress all other modes including higher order leaky modes and array supermodes leaving the single fundamental mode propagating in the arrayed waveguides.


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