The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Sep. 24, 2001
Hiroshi Nomura, Saitama, JP;
Takamitsu Sasaki, Saitama, JP;
Kazunori Ishizuka, Kanagawa, JP;
Maiko Takashima, Tokyo, JP;
Hiroshi Nomura, Saitama, JP;
Takamitsu Sasaki, Saitama, JP;
Kazunori Ishizuka, Kanagawa, JP;
Maiko Takashima, Tokyo, JP;
PENTAX Corporation, Tokyo, JP;
Abstract
An eccentricity-prevention mechanism includes a pair of lens-supporting rings for supporting a pair of lens groups, respectively; and a pair of positioning recesses and a follower projection formed on one and the other of opposed surfaces of the pair of lens-supporting rings, such that the follower projection engages with one of the pair of positioning recess to define a relative position of the pair of lens-supporting rings with respect to the optical axis, at a mutually close position and at a mutually distant position. At least three pairs of the positioning recesses and at least three follower projections are provided at different positions in a circumferential direction, so that eccentricity between the pair of lens-supporting rings is eliminated when all of the follower projections are concurrently brought into engagement with corresponding positioning recesses.