The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Jun. 25, 2002
Applicants:
Chin-cheng Chien, Tainan, TW;
Cheng-jen Chu, Ilan, TW;
Inventors:
Chin-Cheng Chien, Tainan, TW;
Cheng-Jen Chu, Ilan, TW;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F001/1335 ;
U.S. Cl.
CPC ...
Abstract
A method of fabricating a slant reflector with a bump structure, includes the steps of: providing a substrate; forming a layer of photosensitive material on the substrate; patterning the photosensitive material to form a plurality of trapezoidal bumps that have different bottom areas and that are joined to each other at their bottoms; and smoothing the trapezoidal bumps to form a bump structure with an inclined angle. The invention utilizes a photo-mask with a particular pattern and optical diffraction to fabricate the bump structure in a simple way.