The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Feb. 23, 2004
Christian Krueger, Liegau-Augustusbad, DE;
Christian Krueger, Liegau-Augustusbad, DE;
Advanced Micro Devices, Inc., Austin, TX (US);
Abstract
An array of high aspect openings enables fast and accurate measurement of incidence angle deviation and/or beam divergence. The high aspect ratio assures that only ions of a predefined small incidence angle range may reach a conductive detection surface, thereby allowing efficient control of the ion beam parallelism by maximizing the beam current through the high aspect ratio openings. Moreover, if the array of openings is provided with individual beam current measurement points, spatially resolved intensity measurements may be performed that allow estimation of the beam shape. Thus, a movable Faraday cup assembly may be replaced with the stationary array of high aspect ratio openings, thereby improving tool reliability.