The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Nov. 04, 1999
Makoto Ogawa, Tokyo, JP;
Shiho Asai, Tokyo, JP;
Makoto Ogawa, Tokyo, JP;
Shiho Asai, Tokyo, JP;
Japan Science and Technology Agency, Saitama, JP;
Abstract
The present invention is a manufacturing method for an anion-layered double hydroxide intercalation compound that uses metal hydroxides as the stating material of the layered double hydroxides (LDH) which are the host material and allows sterically complicated and large-size anion compounds to be used as the guest material, and it has the characteristics such that a reaction mixture of the metal hydroxides and anion compound is heated and hydrothermally reacted in the absence of anion components other than the anion compound of the guest material. In addition, the present invention pertains to an anion-layered double hydroxide intercalation compound that uses bile acid as the anion compound of the guest material, which is effective as the carrier of medical drugs or as the absorbent of physiological active materials.