The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Jul. 09, 2002
Applicants:
Toshihiro Yoshioka, Tokyo, JP;
Akira Miyakoshi, Tokyo, JP;
Inventors:
Toshihiro Yoshioka, Tokyo, JP;
Akira Miyakoshi, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/8238 ;
U.S. Cl.
CPC ...
Abstract
A method for forming a dielectric film in a PDP includes the steps of: reducing the ambient pressure of an insulating film including a dielectric material before the ambient temperature reaches the reaction temperature of the dielectric material; introducing heated gas to increase the ambient pressure up to the atmospheric pressure while maintaining the ambient temperature at the reaction temperature; and lowering the ambient temperature down to the solidifying temperature of the insulating film while maintaining the atmospheric ambient pressure.