The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Jul. 31, 2002
Matthias Rudolph, Dresden, DE;
Jens Stolze, Dresden, DE;
Thomas Morgenstern, Dresden, DE;
Jana Haensel, Dresden, DE;
Matthias Rudolph, Dresden, DE;
Jens Stolze, Dresden, DE;
Thomas Morgenstern, Dresden, DE;
Jana Haensel, Dresden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
The present invention provides a processing method that changes the given and unfavorable surface contour of a material layer to a predetermined, more favorable surface contour at least along a selected radial direction of the workpiece. Due to the fact that the etch process included into the processing method affects the whole workpiece simultaneously, a high throughput is achievable and the etching method is easily applied in an industrial setting, for example for the mass production of semiconductor products.