The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Mar. 19, 2001
Robert C. Platt, Jr., Laguna Nigel, CA (US);
Mitch Agamohamadi, Orange, CA (US);
Alfredo M. Choperena, San Juan Capistrano, CA (US);
Anthony Lemus, Yorba Linda, CA (US);
Robert C. Platt, Jr., Laguna Nigel, CA (US);
Mitch Agamohamadi, Orange, CA (US);
Alfredo M. Choperena, San Juan Capistrano, CA (US);
Anthony Lemus, Yorba Linda, CA (US);
Ethicon, Inc., Somerville, NJ (US);
Abstract
A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.