The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Feb. 14, 2002
William J. Labarge, Bay City, MI (US);
Mark Hemingway, Columbiaville, MI (US);
Joachim Kupe, Davisburg, MI (US);
Haskell Simpkins, Grand Blanc, MI (US);
William J. LaBarge, Bay City, MI (US);
Mark Hemingway, Columbiaville, MI (US);
Joachim Kupe, Davisburg, MI (US);
Haskell Simpkins, Grand Blanc, MI (US);
Delphi Technologies, Inc., Troy, MI (US);
Abstract
A gas treatment system and method for using the same is disclosed. The gas treatment system, comprises: a non-thermal plasma reactor; and a catalyst composition disposed within said non-thermal plasma reactor, said catalyst composition comprising a MZr(PO), wherein M is a metal selected from the group consisting of platinum, palladium, ruthenium, silver, rhodium, osmium, iridium, and combinations comprising at least one of said foregoing metals. The process comprises exposing said gas to a plasma field and to the catalyst composition.