The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 08, 2005
Filed:
Apr. 17, 2002
Joong-kee Lee, Seoul, KR;
Dal-keun Park, Seoul, KR;
Byung-won Cho, Seoul, KR;
Joo-man Woo, Seoul, KR;
Bup-ju Jeon, Seoul, KR;
Joong-Kee Lee, Seoul, KR;
Dal-Keun Park, Seoul, KR;
Byung-Won Cho, Seoul, KR;
Joo-Man Woo, Seoul, KR;
Bup-Ju Jeon, Seoul, KR;
Korea Institute of Science and Technology, Seoul, KR;
Abstract
A system for chemical vapor deposition at ambient temperature using electron cyclotron resonance (ECR) comprising: an ECR system; a sputtering system for providing the ECR system with metal ion; an organic material supply system for providing organic material of gas or liquid phase; and a DC bias system for inducing the metal ion and the radical ion on a substrate is provided, and a method for fabricating metal composite film comprising: a step of providing a process chamber with the gas as plasma form using the ECR; a step of providing the chamber with the metal ion and the organic material; a step of generating organic material ion and radical ion by reacting the metal ion and the organic material with the plasma; and a step of chemically compounding the organic material ion and the radical ion after inducing them on a surface of a specimen is also provided.