The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Jun. 09, 2000
Takayuki Nakano, Tokyo, JP;
Yasuhisa Tamagawa, Tokyo, JP;
Takayuki Nakano, Tokyo, JP;
Yasuhisa Tamagawa, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A bright wide-angle catoptric system is provided which will not deteriorate the picture quality of images. The wide-angle catoptric system includes, successively from an object, a secondary reflecting mirror having a concave surface, a primary reflecting mirror having a convex surface and a tertiary reflecting mirror having a concave surface, and produces images by reflecting the luminous flux from the object at the primary reflecting mirror, the secondary reflecting mirror and the tertiary reflecting mirror successively. The system also includes a diaphragm arranged in close proximity to the primary reflecting mirror so as to have an optical axis pass through the center of the diaphragm; the optical axis is a straight line connecting the curvature center of the primary reflecting mirror to the curvature center of the secondary reflecting mirror. The tertiary reflecting mirror has its curvature center decentered from the optical axis in the direction of lesser astigmatism.