The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Dec. 24, 2001
Isaac Levanon, Ramat Hasharn, IL;
Yoni Lavi, Raanana, IL;
Isaac Levanon, Ramat Hasharn, IL;
Yoni Lavi, Raanana, IL;
Fly Over Technologies Inc., Rannana, IL;
Abstract
Defects are removed from a tessellated polygonal mesh provided for the rendering of polygon corresponding image parcels through a process that first determines, for a predetermined segment of a first edge of a first polygon within the polygonal mesh, a difference in tessellation level between the first polygon and a second polygon disposed adjacent the predetermined edge of the first polygon, subject to the occurrence of a defect in the polygonal mesh between the first and second polygons. A terminus of the predetermined segment is then computed based on the difference in the tessellation levels and a new vertex, corresponding to the terminus, is added to a first set of vertices that define the first polygon. An image parcel can then be rendered based on the set of vertices, including the added vertex, such that the first image parcel as rendered covers the defect in the polygonal mesh between the first and second polygons.