The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 01, 2005

Filed:

Jun. 24, 1998
Applicants:

Yoshihisa Nagano, Osaka, JP;

Toshie Kutsunai, Osaka, JP;

Yuji Judai, Kyoto, JP;

Yasuhiro Uemoto, Shiga, JP;

Eiji Fujii, Osaka, JP;

Inventors:

Yoshihisa Nagano, Osaka, JP;

Toshie Kutsunai, Osaka, JP;

Yuji Judai, Kyoto, JP;

Yasuhiro Uemoto, Shiga, JP;

Eiji Fujii, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2976 ;
U.S. Cl.
CPC ...
Abstract

A semiconductor device includes: a capacitor provided on a supporting substrate having an integrated circuit thereon and including a lower electrode, a dielectric film, and an upper electrode; a first interlayer insulating film provided so as to cover the capacitor; a first interconnect selectively provided on the first interlayer insulating film and electrically connected to the integrated circuit and the capacitor through a first contact hole formed in the first interlayer insulating film; a second interlayer insulating film formed of ozone TEOS and provided so as to cover the first interconnect; a second interconnect selectively provided on the second interlayer insulating film and electrically connected to the first interconnect through a second contact hole formed in the second interlayer insulating film; and a passivation layer provided so as to cover the second interconnect.


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